Deposition systems

ALD: this is an atom-by-atom thin film deposition technique. It is widely used in the manufacture of semiconductors, electronic devices, etc. It is also used for the protection of metals, tools and jewelry. From Álava Ingenieros, we offer from inexpensive equipment for research, to more complex equipment for production lines or requiring a high level of customization.

PVD: or physical vapor deposition, is a technique used to apply thin coatings on various surfaces. It involves vaporizing a solid material (target) or liquid, inside a reaction chamber under vacuum conditions, converting this target into a gas, deposited on the substrates, forming a thin and uniform layer. It is a process widely used in the manufacturing of cutting tools, electronic devices, optics, decorative components, etc. The most common methods are Thermal deposition, E-Beam, and Sputtering.

CVD: or chemical vapor deposition, is another process used for the formation of thin films on substrates, in this case from chemical reactions of gases. Unlike the previous one, in this case the precursors are in a gaseous state, and are sprayed inside the reaction chamber. It is used in the manufacture of semiconductors, diamond growth, solid protective coatings on substrates, etc.